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Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing | SpringerLink
Semiconductor Process Materials|Semiconductor material: etc
Spin-on Dual Hard Mask Material | JSR Micro, Inc.
Analytics for US Patent No. 6472107, Disposable hard mask for photomask plasma etching
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
Semiconductor Process Materials|Semiconductor material: etc
PDF) Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer | ACS Nano
The micropatterns (first figure) can be achieved by | Chegg.com
Spin-on Dual Hard Mask Material | JSR Micro, Inc.
Innovatively composite hard mask to feature sub-30 nm gate patterning - ScienceDirect
BUSINESS > Semiconductor Materials | DONGJIN SEMICHEM
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Microwaves101 | Photolithography 101
New silicon hard mask material development for sub-5nm node
In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays - Nanoscale (RSC Publishing)
Hard Mask Fabrication (HMF) - NanoSearcher
Etching with a hard mask - Plasma Etching - Texas Powerful Smart
